家电科技 ›› 2025, Vol. 0 ›› Issue (zk): 359-363.doi: 10.19784/j.cnki.issn1672-0172.2025.99.075

• 第三部分 健康适老与智能 • 上一篇    下一篇

基于数字化对烤箱高温清洁性能工况温升改善的分析研究

韩照华1,2, 孙高圆3, 孙圣伟1, 张申1, 李海华1, 权秀芳4   

  1. 1.青岛海尔智慧厨房电器有限公司 山东青岛 266101;
    2.数字家庭网络国家工程研究中心 山东青岛 266101;
    3.江南大学 江苏无锡 214122;
    4.青岛海尔空调电子有限公司 山东青岛 266101
  • 发布日期:2025-12-30
  • 作者简介:韩照华(1966—),男,高级工程师。研究方向:结构研发、家电智能升级及新材料、新技术研究应用。E-mail:hanzhh.wgg@haier.com。

Analysis and research on the improvement of temperature rise in high-temperature cleaning performance of ovens based on digitalization

Han Zhaohua1,2, Sun Gaoyuan3, Sun Shengwei1, Zhang Shen1, Li Haihua1, Quan Xiufang4   

  1. 1. Qingdao Haier smart kitchen appliance Co., Ltd. Qingdao 266101;
    2. National Engineering Research Center of Digital Home Networking Qingdao 266101;
    3. Jiangnan University Wuxi 214122;
    4. Qingdao Haier Air-Condition Electronic Co., Ltd. Qingdao 266101
  • Published:2025-12-30

摘要: 烤箱经过长期烧烤烹饪后,烘焙腔体内壁往往积累沉淀许多油脂污物,尤其是边角处很难清理,成为行业痛点。通过创新设计烤箱高温自清洁技术,智能控制程序将烤箱在30 min内快速加热至450 ℃以上极高温度,再历时90 min左右焚烧/热裂解内部食物残渣、油脂污渍等杂质,待冷却常温之后只需简单擦拭即可锃亮如新,完成清洁。针对高温清洁过程中产生的大量余热,需要一个高效的热管理系统来支持不同模式下的温度控制,确保发热和散热维持动态平衡,避免工况温升过高导致操控电子元器件功能失效,成为急需解决关键技术难题。通过对烤箱高温自清洁功能机理分析,搭建烤箱高温自清洁工况温升数字化模型,对影响温升关键因子、主要元器件技术参数甄选优化设计,并结合CAE仿真分析,实验验证,使得烤箱高温自清洁箱体空间工况温升由84.61 ℃降低至68.58 ℃,保障操控系统电子元器件和整机工作安全可靠性,并有效提升清洁效果。

关键词: 烤箱, 高温自清洁, 智能控制, 数字化, 研究应用

Abstract: after long-term grilling and cooking in the oven, the inner walls of the baking cavity often accumulate and settle a lot of grease and dirt, especially in the corners which are difficult to clean, becoming a pain point in the industry. Through the innovative design of high-temperature self-cleaning technology for the oven, the intelligent control program can rapidly heat the oven to an extremely high temperature of over 450℃ within 30 minutes, and then take about 90 minutes to incinerate or thematically crack the food residues, grease stains and other impurities inside. After cooling to room temperature, it only needs a simple wipe to shine like new and complete the cleaning. In view of the large amount of residual heat generated during the high-temperature cleaning process, an efficient thermal management system is needed to support temperature control under different modes, maintaining a dynamic balance between heat generation and heat dissipation, and avoiding excessive temperature rise under working conditions that could lead to the failure of control electronic components. This has become an urgent key technical problem to be solved. Through the analysis of the mechanism of the high-temperature self-cleaning function of the oven, a digital model of the temperature rise under the high-temperature self-cleaning condition of the oven was built. The key factors affecting the temperature rise and the technical parameters of the main components were carefully selected and optimized. Combined with CAE simulation analysis and experimental verification, the temperature rise in the space of the high-temperature self-cleaning box of the oven was reduced from 84.61 ℃ to 68.58 ℃. Ensure the safety and reliability of the electronic components of the control system and the entire machine, and effectively enhance the cleaning effect.

Key words: Oven, High-temperature self-cleaning, Intelligent control, Digitalization, Research and application

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